Patterned electrochemical deposition of copper using an electron beam
نویسندگان
چکیده
منابع مشابه
Electron-beam-induced patterned deposition of allylcyclopentadienyl palladium using scanning tunneling microscopy
متن کامل
Electrochemical Polishing of Patterned Copper Films
For decades Electrochemical Polishing (ECP) has been used for surface polishing of bulk metal materials such as copper and stainless steel. However, it was found very challenging to planarize patterned copper films electrodeposited on silicon wafers. This work studied the mechanisms of ECP, the surface profiles and ECP effects of copper bulk and films in various electrolyte solutions. Satisfied...
متن کاملMeasurements of Photon Beam Flattening Filter Using an Anisotropic Analytical Algorithm and Electron Beam Employing Electron Monte Carlo
Introduction: This study aimed to report the measurement of photon and electron beams to configure the Analytical Anisotropic Algorithm and Electron Monte Carlo used in clinical treatment. Material and Methods: All measurements were performed in a large water phantom using a 3-dimensional scanning system (PTW, Germany). ...
متن کاملCombinatorial Investigation of Intermetallics Using Electron - Beam Deposition
Title of Dissertation: Combinatorial Investigation of Intermetallics Using Electron-beam Deposition Hiroyuki Oguchi, Doctor of Philosophy, 2008 Directed By: Professor Ichiro Takeuchi, Materials Science & Engineering We have systematically studied subtle changes in physical properties of intermetallics using the combinatorial strategy where a large number of samples with systematically changed p...
متن کاملPatterned negative electron affinity photocathodes for maskless electron beam lithography
This work focuses on two issues crucial to achieving high throughput with a negative electron affinity semiconductor photocathode source. Monte Carlo simulations indicate that for a 50 kV system, as much as 8 mA of current may be delivered to the wafer to achieve a raw throughput of 20 8 in. wafers per hour with 0.1 mm minimum feature size ~assuming a resist sensitivity of 10 mC/cm!. In order t...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: APL Materials
سال: 2014
ISSN: 2166-532X
DOI: 10.1063/1.4863596